"Influence of rapid thermal annealing temperature on structure and ..."

Cong Ye et al. (2014)

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DOI: 10.1016/J.MICROREL.2013.10.014

access: closed

type: Journal Article

metadata version: 2024-10-06

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Cong Ye, Chao Zhan, Jieqiong Zhang, Hao Wang, Tengfei Deng, Shiruo Tang:
Influence of rapid thermal annealing temperature on structure and electrical properties of high permittivity HfTiO thin film used in MOSFET. Microelectron. Reliab. 54(2): 388-392 (2014)

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