"Standard and self-sustained magnetron sputtering deposited Cu films ..."

Artur Wiatrowski et al. (2011)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2011.02.024

access: closed

type: Journal Article

metadata version: 2021-10-14

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/WiatrowskiPJSSG11
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/WiatrowskiPJSSG11
Artur Wiatrowski, W. M. Posadowski, Grzegorz Józwiak, Jaroslaw Serafinczuk, R. F. Szeloch, Teodor P. Gotszalk:
Standard and self-sustained magnetron sputtering deposited Cu films investigated by means of AFM and XRD. Microelectron. Reliab. 51(7): 1203-1206 (2011)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.