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"Reliability challenges for copper low-k dielectrics and copper diffusion ..."

Zsolt Tökei, Yunlong Li, G. P. Beyer (2005)

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DOI: 10.1016/J.MICROREL.2005.07.040

access: closed

type: Journal Article

metadata version: 2022-12-02

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Zsolt Tökei, Yunlong Li, G. P. Beyer:
Reliability challenges for copper low-k dielectrics and copper diffusion barriers. Microelectron. Reliab. 45(9-11): 1436-1442 (2005)

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