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"Room temperature plasma oxidation mechanism to obtain ultrathin silicon ..."

Julio C. Tinoco, Magali Estrada, G. Romero (2003)

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DOI: 10.1016/S0026-2714(03)00098-2

access: closed

type: Journal Article

metadata version: 2020-12-22

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Julio C. Tinoco, Magali Estrada, G. Romero:
Room temperature plasma oxidation mechanism to obtain ultrathin silicon oxide and titanium oxide layers. Microelectron. Reliab. 43(6): 895-903 (2003)

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