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"Impact of local structural and electrical properties of grain boundaries ..."

Kalya Shubhakar et al. (2014)

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DOI: 10.1016/J.MICROREL.2014.07.154

access: closed

type: Journal Article

metadata version: 2023-03-21

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Kalya Shubhakar, Nagarajan Raghavan, Sunil Singh Kushvaha, Michel Bosman, Zhongrui Wang, Sean J. O'Shea, Kin Leong Pey:
Impact of local structural and electrical properties of grain boundaries in polycrystalline HfO₂ on reliability of SiO_x interfacial layer. Microelectron. Reliab. 54(9-10): 1712-1717 (2014)

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