"Photo-CVD process for ultra thin SiO₂ films."

V. Sánchez, J. Munguía, Magali Estrada (2004)

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DOI: 10.1016/J.MICROREL.2004.02.003

access: closed

type: Journal Article

metadata version: 2020-02-22

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V. Sánchez, J. Munguía, Magali Estrada:
Photo-CVD process for ultra thin SiO₂ films. Microelectron. Reliab. 44(5): 885-888 (2004)

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