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"Time gating imaging through thick silicon substrate: a new step towards ..."

Jean-Michel Rampnoux et al. (2006)

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DOI: 10.1016/J.MICROREL.2006.07.029

access: closed

type: Journal Article

metadata version: 2021-10-14

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Jean-Michel Rampnoux, H. Michel, M. Amine Salhi, Stéphane Grauby, Wilfrid Claeys, Stefan Dilhaire:
Time gating imaging through thick silicon substrate: a new step towards backside characterisation. Microelectron. Reliab. 46(9-11): 1520-1524 (2006)

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