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"Total ionizing dose response of fluorine implanted Silicon-On-Insulator ..."

Kenneth Potter et al. (2014)

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DOI: 10.1016/J.MICROREL.2014.07.018

access: closed

type: Journal Article

metadata version: 2020-02-22

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Kenneth Potter, Katrina A. Morgan, Chris Shaw, Peter Ashburn, William Redman-White, C. H. De Groot:
Total ionizing dose response of fluorine implanted Silicon-On-Insulator buried oxide. Microelectron. Reliab. 54(9-10): 2339-2343 (2014)

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