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"A novel approach to characterization of progressive breakdown in ..."

R. Pagano et al. (2008)

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DOI: 10.1016/J.MICROREL.2008.07.071

access: closed

type: Journal Article

metadata version: 2021-10-14

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R. Pagano, Salvatore Lombardo, Felix Palumbo, Paul Kirsch, S. A. Krishnan, Chadwin D. Young, Rino Choi, Gennadi Bersuker, James H. Stathis:
A novel approach to characterization of progressive breakdown in high-k/metal gate stacks. Microelectron. Reliab. 48(11-12): 1759-1764 (2008)

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