"Local damage free Si substrate ultra thinning for backside emission ..."

Takuya Naoe et al. (2013)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2013.05.013

access: closed

type: Journal Article

metadata version: 2020-02-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/NaoeIMEY13
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/NaoeIMEY13
Takuya Naoe, Tamao Ikeuchi, Chie Moritni, Hirohiko Endoh, Kohichi Yokoyama:
Local damage free Si substrate ultra thinning for backside emission spectral analysis using OBPF for LSI failure mode detection. Microelectron. Reliab. 53(12): 1829-1840 (2013)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.