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"Experimental study of multilayer SiCN barrier film in 45/40 nm ..."
Ming Zhou et al. (2016)
- Ming Zhou, Xiao De Yuan, Peng Shi Min, Hong Zhong Shan, Shu Yi Xie:
Experimental study of multilayer SiCN barrier film in 45/40 nm technological node and beyond. Microelectron. Reliab. 57: 86-92 (2016)
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