"Time dependent dielectric breakdown in a low-k interlevel dielectric."

J. R. Lloyd, E. Liniger, S. T. Chen (2004)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2004.07.098

access: closed

type: Journal Article

metadata version: 2020-02-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/LloydLC04
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/LloydLC04
J. R. Lloyd, E. Liniger, S. T. Chen:
Time dependent dielectric breakdown in a low-k interlevel dielectric. Microelectron. Reliab. 44(9-11): 1861-1865 (2004)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.