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"Reservoir effect and maximum allowed VIA misalignment for AlCu ..."

Yuan Li et al. (2003)

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DOI: 10.1016/S0026-2714(03)00257-9

access: closed

type: Journal Article

metadata version: 2020-02-22

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  - journals/mr/LiVDPZK03
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  - https://dblp.org/rec/journals/mr/LiVDPZK03
Yuan Li, Klaas Jelle Veenstra, Jérôme Dubois, Lei Peters-Wu, Agnes van Zomeren, Fred G. Kuper:
Reservoir effect and maximum allowed VIA misalignment for AlCu interconnect with tungsten VIA plug. Microelectron. Reliab. 43(9-11): 1449-1454 (2003)

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