Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Evidence of chlorine ion penetration in InP/InAsP quantum well structures ..."

Jean-Pierre Landesman et al. (2015)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2015.07.029

access: closed

type: Journal Article

metadata version: 2022-10-02

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/LandesmanLJPLBD15
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/LandesmanLJPLBD15
Jean-Pierre Landesman, Christophe Levallois, Juan Jiménez, Frédéric Pommereau, Yoan Léger, Alexandre Beck, Thomas Delhaye, Alfredo Torres, Cesare Frigeri, Ahmed Rhallabi:
Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour. Microelectron. Reliab. 55(9-10): 1750-1753 (2015)

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.