"Soft breakdown of MOS tunnel diodes with a spatially non-uniform oxide ..."

R. Khlil et al. (2004)

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DOI: 10.1016/J.MICROREL.2003.12.008

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type: Journal Article

metadata version: 2022-10-02

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R. Khlil, A. El Hdiy, A. F. Shulekin, S. E. Tyaginov, M. I. Vexler:
Soft breakdown of MOS tunnel diodes with a spatially non-uniform oxide thickness. Microelectron. Reliab. 44(3): 543-546 (2004)

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