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"Effect of interface traps for ultra-thin high-k gate dielectric based MIS ..."

Slah Hlali et al. (2017)

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DOI: 10.1016/J.MICROREL.2017.06.056

access: closed

type: Journal Article

metadata version: 2020-02-22

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Slah Hlali, Neila Hizem, Liviu Militaru, A. Kalboussi, Abdelkader Souifi:
Effect of interface traps for ultra-thin high-k gate dielectric based MIS devices on the capacitance-voltage characteristics. Microelectron. Reliab. 75: 154-161 (2017)

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