Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Modeling the effect of barrier thickness and low-k dielectric on circuit ..."

Feifei He, Cher Ming Tan (2010)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2010.07.111

access: closed

type: Journal Article

metadata version: 2020-02-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/HeT10a
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/HeT10a
Feifei He, Cher Ming Tan:
Modeling the effect of barrier thickness and low-k dielectric on circuit reliability using 3D model. Microelectron. Reliab. 50(9-11): 1327-1331 (2010)

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.