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"Width dependence of the effectiveness of reservoir length in improving ..."

C. M. Fu et al. (2010)

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DOI: 10.1016/J.MICROREL.2010.07.133

access: closed

type: Journal Article

metadata version: 2020-02-22

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C. M. Fu, Cher Ming Tan, S. H. Wu, H. B. Yao:
Width dependence of the effectiveness of reservoir length in improving electromigration for Cu/Low-k interconnects. Microelectron. Reliab. 50(9-11): 1332-1335 (2010)

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