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"Impact of bilayer character on High K gate stack dielectrics breakdown ..."
R. Foissac et al. (2013)
- R. Foissac, S. Blonkowski, M. Kogelschatz, P. Delcroix, M. Gros-Jean, F. Bassani:
Impact of bilayer character on High K gate stack dielectrics breakdown obtained by conductive atomic force microscopy. Microelectron. Reliab. 53(12): 1857-1862 (2013)
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