"Impact of nitrogen incorporation on interface states in ..."

Y. G. Fedorenko et al. (2005)

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DOI: 10.1016/J.MICROREL.2004.11.044

access: closed

type: Journal Article

metadata version: 2020-02-22

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Y. G. Fedorenko, L. Truong, V. V. Afanasev, A. Stesmans, Z. Zhang, Stephen A. Campbell:
Impact of nitrogen incorporation on interface states in (100)Si/HfO₂. Microelectron. Reliab. 45(5-6): 802-805 (2005)

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