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"Effects of base layer thickness on reliability of CVD ..."

Koji Eriguchi, Yoshinao Harada, Masaaki Niwa (2001)

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DOI: 10.1016/S0026-2714(00)00247-X

access: closed

type: Journal Article

metadata version: 2020-02-22

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Koji Eriguchi, Yoshinao Harada, Masaaki Niwa:
Effects of base layer thickness on reliability of CVD Si₃N₄ stack gate dielectrics. Microelectron. Reliab. 41(4): 587-595 (2001)

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