Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Electrical properties of metal-HfO2-silicon system measured ..."

Fu-Chien Chiu, Shun-An Lin, Joseph Ya-min Lee (2005)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2004.11.016

access: closed

type: Journal Article

metadata version: 2020-02-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/ChiuLL05
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/ChiuLL05
Fu-Chien Chiu, Shun-An Lin, Joseph Ya-min Lee:
Electrical properties of metal-HfO₂-silicon system measured from metal-insulator-semiconductor capacitors and metal-insulator-semiconductor field-effect transistors using HfO₂ gate dielectric. Microelectron. Reliab. 45(5-6): 961-964 (2005)

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.