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"The die-to-die calibrated combined model of negative bias temperature ..."

Soonyoung Cha et al. (2015)

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DOI: 10.1016/J.MICROREL.2015.06.105

access: closed

type: Journal Article

metadata version: 2022-01-06

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Soonyoung Cha, Dae Hyun Kim, Taizhi Liu, Linda S. Milor:
The die-to-die calibrated combined model of negative bias temperature instability and gate oxide breakdown from device to system. Microelectron. Reliab. 55(9-10): 1404-1411 (2015)

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