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"Breakdown spots of ultra-thin (EOT<1.5nm) ..."

X. Blasco et al. (2005)

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DOI: 10.1016/J.MICROREL.2004.11.042

access: closed

type: Journal Article

metadata version: 2020-02-22

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X. Blasco, Montserrat Nafría, Xavier Aymerich, J. Pétry, Wilfried Vandervorst:
Breakdown spots of ultra-thin (EOT<1.5nm) HfO₂/SiO₂ stacks observed with enhanced - CAFM. Microelectron. Reliab. 45(5-6): 811-814 (2005)

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