"Study of reactive ion etching process to fabricate the PMMA-based polymer ..."

Y. Zhao et al. (2004)

> Home

Details and statistics

DOI: 10.1016/J.MEJO.2004.02.005

access: closed

type: Journal Article

metadata version: 2020-03-09

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mj/ZhaoWCZZZLY04
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mj/ZhaoWCZZZLY04
Y. Zhao, F. Wang, Z. C. Cui, J. Zheng, H. M. Zhang, Daming Zhang, S. Y. Liu, Maobin Yi:
Study of reactive ion etching process to fabricate the PMMA-based polymer waveguide. Microelectron. J. 35(7): 605-608 (2004)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.