"A comparative study on a high aspect ratio contact hole etching in UFC- ..."

Hyun-Kyu Ryu et al. (2007)

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DOI: 10.1016/J.MEJO.2006.09.002

access: closed

type: Journal Article

metadata version: 2020-02-22

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  - https://dblp.org/rec/journals/mj/RyuKLSK07
Hyun-Kyu Ryu, Yil-Wook Kim, Kangtaek Lee, Chee Burm Shin, Chang-Koo Kim:
A comparative study on a high aspect ratio contact hole etching in UFC- and PFC-containing plasmas. Microelectron. J. 38(1): 125-129 (2007)

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