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"A statistical yield optimization framework for interconnect in double ..."

Minoo Mirsaeedi, Mohab H. Anis (2011)

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DOI: 10.1016/J.MEJO.2011.08.006

access: closed

type: Journal Article

metadata version: 2020-02-22

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Minoo Mirsaeedi, Mohab H. Anis:
A statistical yield optimization framework for interconnect in double patterning lithography. Microelectron. J. 42(11): 1231-1238 (2011)

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