"Scratch-concerned yield modeling for IC manufacturing involved with a ..."

Jiao-jiao Zhu et al. (2012)

> Home

Details and statistics

DOI: 10.1631/JZUS.C1100242

access: closed

type: Journal Article

metadata version: 2020-05-13

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/jzusc/ZhuLCYY12
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/jzusc/ZhuLCYY12
Jiao-jiao Zhu, Xiao-hua Luo, Li-sheng Chen, Yi Ye, Xiaolang Yan:
Scratch-concerned yield modeling for IC manufacturing involved with a chemical mechanical polishing process. J. Zhejiang Univ. Sci. C 13(5): 376-384 (2012)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.