![](https://dblp.uni-trier.de/img/logo.ua.320x120.png)
![](https://dblp.uni-trier.de/img/dropdown.dark.16x16.png)
![](https://dblp.uni-trier.de/img/peace.dark.16x16.png)
Остановите войну!
for scientists:
![search dblp search dblp](https://dblp.uni-trier.de/img/search.dark.16x16.png)
![search dblp](https://dblp.uni-trier.de/img/search.dark.16x16.png)
default search action
"Two-step gate-recess process combining selective wet-etching and digital ..."
Yinghui Zhong et al. (2017)
- Yinghui Zhong
, Shu-xiang Sun, Wen-bin Wong, Haili Wang, Xiao-Ming Liu, Zhiyong Duan, Peng Ding, Zhi Jin:
Two-step gate-recess process combining selective wet-etching and digital wet-etching for InAlAs/InGaAs InP-based HEMTs. Frontiers Inf. Technol. Electron. Eng. 18(8): 1180-1185 (2017)
![](https://dblp.uni-trier.de/img/cog.dark.24x24.png)
manage site settings
To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.