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"Automated Adsorption Workflow for Semiconductor Surfaces and the ..."

Oxana Andriuc et al. (2021)

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DOI: 10.1021/ACS.JCIM.1C00340

access: closed

type: Journal Article

metadata version: 2023-02-24

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Oxana Andriuc, Martin Siron, Joseph H. Montoya, Matthew K. Horton, Kristin A. Persson:
Automated Adsorption Workflow for Semiconductor Surfaces and the Application to Zinc Telluride. J. Chem. Inf. Model. 61(8): 3908-3916 (2021)

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