"Etching characteristics of a silicon surface induced by focused ion beam ..."

Noritaka Kawasegi et al. (2006)

> Home

Details and statistics

DOI: 10.1504/IJMTM.2006.009984

access: closed

type: Journal Article

metadata version: 2020-06-04

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/ijmtm/KawasegiMYTOATMM06
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/ijmtm/KawasegiMYTOATMM06
Noritaka Kawasegi, Noboru Morita, Shigeru Yamada, Noboru Takano, Tatsuo Oyama, Kiwamu Ashida, Jun Taniguchi, Iwao Miyamoto, Sadao Momota:
Etching characteristics of a silicon surface induced by focused ion beam irradiation. Int. J. Manuf. Technol. Manag. 9(1/2): 34-50 (2006)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.