"Low-Temperature Atomic Layer Deposition of AlN Using Trimethyl Aluminum ..."

Kentaro Saito et al. (2022)

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DOI: 10.1587/TRANSELE.2021FUP0001

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type: Journal Article

metadata version: 2023-06-26

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Kentaro Saito, Kazuki Yoshida, Masanori Miura, Kensaku Kanomata, Bashir Ahmmad, Shigeru Kubota, Fumihiko Hirose:
Low-Temperature Atomic Layer Deposition of AlN Using Trimethyl Aluminum and Plasma Excited Ar Diluted Ammonia. IEICE Trans. Electron. 105-C(10): 596-603 (2022)

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