"Gate-Last MISFET Structures and Process for Characterization of High-k and ..."

Takeo Matsuki et al. (2005)

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DOI: 10.1093/IETELE/E88-C.5.804

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type: Journal Article

metadata version: 2020-04-11

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Takeo Matsuki, Kazuyoshi Torii, Takeshi Maeda, Yasushi Akasaka, Kiyoshi Hayashi, Naoki Kasai, Tsunetoshi Arikado:
Gate-Last MISFET Structures and Process for Characterization of High-k and Metal Gate MISFETs. IEICE Trans. Electron. 88-C(5): 804-810 (2005)

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