"High-Rate Oblique Deposition of SiO2 Films Using Two Sputtering ..."

Yoichi Hoshi et al. (2008)

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DOI: 10.1093/IETELE/E91-C.10.1644

access: closed

type: Journal Article

metadata version: 2020-04-11

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Yoichi Hoshi, Kensuke Yagi, Eisuke Suzuki, Hao Lei, Akira Sakai:
High-Rate Oblique Deposition of SiO₂ Films Using Two Sputtering Sources. IEICE Trans. Electron. 91-C(10): 1644-1648 (2008)

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