"Effect of double-patterning and double-etching on the line-edge-roughness ..."

In Jun Park, Changhwan Shin (2013)

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DOI: 10.1587/ELEX.10.20130108

access: open

type: Journal Article

metadata version: 2021-02-12

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  - https://dblp.org/rec/journals/ieiceee/ParkS13
In Jun Park, Changhwan Shin:
Effect of double-patterning and double-etching on the line-edge-roughness of multi-gate bulk MOSFETs. IEICE Electron. Express 10(5): 20130108 (2013)

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