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ORCID"Investigation of Cu ion drift through CVD TiSiN into SiO2 under bias ..."
Takashi Kawanoue et al. (2005)
- Takashi Kawanoue, Seiichi Omoto, Masahiko Hasunuma, Takashi Yoda:
Investigation of Cu ion drift through CVD TiSiN into SiO2 under bias temperature stress conditions. IEICE Electron. Express 2(7): 254-259 (2005)
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