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"Lithography at a wavelength of 193 nm."
Mordechai Rothschild et al. (1997)
- Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek:
Lithography at a wavelength of 193 nm. IBM J. Res. Dev. 41(1&2): 49-56 (1997)
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