"Review of technology for 157-nm lithography."

A. Keith Bates et al. (2001)

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DOI: 10.1147/RD.455.0605

access: closed

type: Journal Article

metadata version: 2020-03-13

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A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes:
Review of technology for 157-nm lithography. IBM J. Res. Dev. 45(5): 605-614 (2001)

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