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"Modeling of electron beam scattering in high resolution lithography for ..."

M. Gentili et al. (1990)

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DOI: 10.1002/ETT.4460010211

access: closed

type: Journal Article

metadata version: 2020-05-18

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M. Gentili, A. Lucchesini, L. Scopa, Paolo Lugli, A. Paoletti, G. Messina, S. Santangelo, A. Tucciarone:
Modeling of electron beam scattering in high resolution lithography for the fabrication of X-Ray masks. Eur. Trans. Telecommun. 1(2): 143-147 (1990)

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