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"Continual Diffusion with STAMINA: STack-And-Mask INcremental Adapters."

James Seale Smith et al. (2023)

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DOI: 10.48550/ARXIV.2311.18763

access: open

type: Informal or Other Publication

metadata version: 2023-12-05

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  dblp key:
  - journals/corr/abs-2311-18763
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  - https://dblp.org/rec/journals/corr/abs-2311-18763
James Seale Smith, Yen-Chang Hsu, Zsolt Kira, Yilin Shen, Hongxia Jin:
Continual Diffusion with STAMINA: STack-And-Mask INcremental Adapters. CoRR abs/2311.18763 (2023)

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