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"Process optimization of plasma nitridation SiON for 65 nm node gate ..."

Yandong He, Xing Zhang, Yangyuan Wang (2011)

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DOI: 10.1007/S11432-011-4321-9

access: closed

type: Journal Article

metadata version: 2021-02-14

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Yandong He, Xing Zhang, Yangyuan Wang:
Process optimization of plasma nitridation SiON for 65 nm node gate dielectrics. Sci. China Inf. Sci. 54(12): 2673-2679 (2011)

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