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"Integration of feedback control and run-to-run control for plasma enhanced ..."

Sungil Yun et al. (2021)

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DOI: 10.1016/J.COMPCHEMENG.2021.107267

access: closed

type: Journal Article

metadata version: 2021-06-01

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  - https://dblp.org/rec/journals/cce/YunDZC21
Sungil Yun, Yangyao Ding, Yichi Zhang, Panagiotis D. Christofides:
Integration of feedback control and run-to-run control for plasma enhanced atomic layer deposition of hafnium oxide thin films. Comput. Chem. Eng. 148: 107267 (2021)

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