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"Improvement of principal component analysis modeling for plasma etch ..."

Daegeun Ha et al. (2016)

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DOI: 10.1016/J.COMPCHEMENG.2016.08.012

access: closed

type: Journal Article

metadata version: 2020-10-26

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Daegeun Ha, Damdae Park, Junmo Koo, Kye Hyun Baek, Chonghun Han:
Improvement of principal component analysis modeling for plasma etch processes through discrete wavelet transform and automatic variable selection. Comput. Chem. Eng. 94: 362-369 (2016)

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