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"Machine learning-based modeling and operation of plasma-enhanced atomic ..."

Yangyao Ding et al. (2021)

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DOI: 10.1016/J.COMPCHEMENG.2020.107148

access: closed

type: Journal Article

metadata version: 2020-12-16

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Yangyao Ding, Yichi Zhang, Ho Yeon Chung, Panagiotis D. Christofides:
Machine learning-based modeling and operation of plasma-enhanced atomic layer deposition of hafnium oxide thin films. Comput. Chem. Eng. 144: 107148 (2021)

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