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"Multi-stage defect prediction and classification model to reduce the ..."

Nhat-To Huynh (2024)

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DOI: 10.1016/J.CIE.2023.109778

access: closed

type: Journal Article

metadata version: 2024-01-25

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Nhat-To Huynh:
Multi-stage defect prediction and classification model to reduce the inspection time in semiconductor back end manufacturing process and an empirical application. Comput. Ind. Eng. 187: 109778 (2024)

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