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"Origin of Low-Frequency Noise in Si n-MOSFET at Cryogenic Temperatures: ..."
Hiroshi Oka et al. (2023)
- Hiroshi Oka, Takumi Inaba, Shunsuke Shitakata, Kimihiko Kato, Shota Iizuka, Hidehiro Asai, Hiroshi Fuketa, Takahiro Mori:
Origin of Low-Frequency Noise in Si n-MOSFET at Cryogenic Temperatures: The Effect of Interface Quality. IEEE Access 11: 121567-121573 (2023)
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