"Modeling and Analysis of the Nonrectangular Gate Effect for ..."

Ritu Singhal et al. (2010)

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DOI: 10.1109/TVLSI.2009.2013630

access: closed

type: Journal Article

metadata version: 2023-06-23

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Ritu Singhal, Asha Balijepalli, Anupama R. Subramaniam, Chi-Chao Wang, Frank Liu, Sani R. Nassif, Yu Cao:
Modeling and Analysis of the Nonrectangular Gate Effect for Postlithography Circuit Simulation. IEEE Trans. Very Large Scale Integr. Syst. 18(4): 666-670 (2010)

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