Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer ..."

Arthur Tay et al. (2009)

> Home

Details and statistics

DOI: 10.1109/TIM.2009.2021620

access: closed

type: Journal Article

metadata version: 2022-01-03

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/tim/TayHWC09
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/tim/TayHWC09
Arthur Tay, Weng Khuen Ho, Xiaodong Wu, Xiaoqi Chen:
In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography. IEEE Trans. Instrum. Meas. 58(12): 3978-3984 (2009)

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.