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"Metal-layer capacitors in the 65 nm CMOS process and the application for ..."

Po-Yen Chiu, Ming-Dou Ker (2014)

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DOI: 10.1016/J.MICROREL.2013.08.011

access: closed

type: Journal Article

metadata version: 2020-02-22

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Po-Yen Chiu, Ming-Dou Ker:
Metal-layer capacitors in the 65 nm CMOS process and the application for low-leakage power-rail ESD clamp circuit. Microelectron. Reliab. 54(1): 64-70 (2014)

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