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"Electron fluence driven, Cu catalyzed, interface breakdown mechanism for ..."

Fen Chen, Michael A. Shinosky (2014)

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DOI: 10.1016/J.MICROREL.2013.12.020

access: closed

type: Journal Article

metadata version: 2020-02-22

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Fen Chen, Michael A. Shinosky:
Electron fluence driven, Cu catalyzed, interface breakdown mechanism for BEOL low-k time dependent dielectric breakdown. Microelectron. Reliab. 54(3): 529-540 (2014)

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